New PDF release: Atomic Layer Deposition: Principles, Characteristics, and

By Tommi Kääriäinen,David Cameron,Marja-Leena Kääriäinen,Arthur Sherman

because the first version used to be released in 2008, Atomic Layer Deposition (ALD) has emerged as a robust, and occasionally most well-liked, deposition expertise. the hot version of this groundbreaking monograph is the 1st textual content to check the topic of ALD comprehensively from a realistic point of view. It covers ALD's software to microelectronics (MEMS) and nanotechnology; many vital new and rising purposes; thermal techniques for ALD development of nanometer thick motion pictures of semiconductors, oxides, metals and nitrides; and the formation of natural and hybrid materials.

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Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications by Tommi Kääriäinen,David Cameron,Marja-Leena Kääriäinen,Arthur Sherman


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